説明
No: dry pump, RF rack, pump rack構成
Novellus Concept Two Altus W-CVD - Nitride - Non Shrink - 1 Chamber standard - 1 Chamber PNL Mod s - Load Type :Standard - Process Module Type: CVD-WS Transfer Module Configuration - DLCM Type: DLCM-3 - Cassette Interface: Platform - Robot Type: Mag7 - Arm Set: Dual Arm - Cool Station: 3-Level - Pressure Guage: MKS 100torr - Throttle Valve: MDV-015 - Throttle Valve Controller: Missing Chamber Configuration - Chamber B CVD: C2-CVD-WS(A) - Chamber C CVD: C2-CVD-WS(A) - Pedestal: 200mm - Throttle Valve: MDVX-100b - Isolation Valve: 14040-PE44-AAL2 - RF Matcher: Trazer, Amu2-1 - RF Generator: AE, RFG 3000 - Gas Configuration: Pm-B - Gas-C Ar 5slpm - Gas-D Ar 20slpm - Gas-E Wf6 500sccm - Gas-1 Ar 5slpm - Gas-8 Ar 10slpm - Gas-4 Ar 10slpm - Gas-9 H2 25slpm - Gas-3 H2 20slpm - Gas-B 5% B2h6/N2 500sccm - Gas-6 C2f6 2slpm - Gas-5 Wf6 500sccm - Gas-7 O2 2slpm - Gas-2 Sih4 250sccm - Mfm1 Ar 1slpm Missing / Repair: - Process/Transfer/LL/Pedestal Pumps - Heater Jackets - New Abatement System - Controllers - Heater Pedestals - Showerheads - Pressure Transducers - 3 Way Pneumatic Valves - 2 Way Pneumatic Valves - Gas Sensors - Shuttle/SMIF Loaders - Throttle Valves - Gate Valves - RF Generator - DLCM System Controller - Power SuppliesOEMモデルの説明
Novellus Systems introduced the Concept Two-ALTUS in 1993. It is a chemical vapor deposition reactor system that combines the modular architecture of the Concept Two system with an advanced tungsten CVD process chamber. The system features a new dual loadlock cassette module with full factory automation capability to meet the high throughput requirements of high volume automated eight inch wafer fabs. This dual loadlock cassette handler permits continuous operation of the process chamber with one loadlock, while a second loadlock is simultaneously being loaded or unloaded by the operator in the cleanroom.ドキュメント
ドキュメントなし
LAM RESEARCH / NOVELLUS
CONCEPT TWO "C2" ALTUS
検証済み
カテゴリ
MOCVD
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
102818
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
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Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
LAM RESEARCH / NOVELLUS
CONCEPT TWO "C2" ALTUS
カテゴリ
MOCVD
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
102818
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
No: dry pump, RF rack, pump rack構成
Novellus Concept Two Altus W-CVD - Nitride - Non Shrink - 1 Chamber standard - 1 Chamber PNL Mod s - Load Type :Standard - Process Module Type: CVD-WS Transfer Module Configuration - DLCM Type: DLCM-3 - Cassette Interface: Platform - Robot Type: Mag7 - Arm Set: Dual Arm - Cool Station: 3-Level - Pressure Guage: MKS 100torr - Throttle Valve: MDV-015 - Throttle Valve Controller: Missing Chamber Configuration - Chamber B CVD: C2-CVD-WS(A) - Chamber C CVD: C2-CVD-WS(A) - Pedestal: 200mm - Throttle Valve: MDVX-100b - Isolation Valve: 14040-PE44-AAL2 - RF Matcher: Trazer, Amu2-1 - RF Generator: AE, RFG 3000 - Gas Configuration: Pm-B - Gas-C Ar 5slpm - Gas-D Ar 20slpm - Gas-E Wf6 500sccm - Gas-1 Ar 5slpm - Gas-8 Ar 10slpm - Gas-4 Ar 10slpm - Gas-9 H2 25slpm - Gas-3 H2 20slpm - Gas-B 5% B2h6/N2 500sccm - Gas-6 C2f6 2slpm - Gas-5 Wf6 500sccm - Gas-7 O2 2slpm - Gas-2 Sih4 250sccm - Mfm1 Ar 1slpm Missing / Repair: - Process/Transfer/LL/Pedestal Pumps - Heater Jackets - New Abatement System - Controllers - Heater Pedestals - Showerheads - Pressure Transducers - 3 Way Pneumatic Valves - 2 Way Pneumatic Valves - Gas Sensors - Shuttle/SMIF Loaders - Throttle Valves - Gate Valves - RF Generator - DLCM System Controller - Power SuppliesOEMモデルの説明
Novellus Systems introduced the Concept Two-ALTUS in 1993. It is a chemical vapor deposition reactor system that combines the modular architecture of the Concept Two system with an advanced tungsten CVD process chamber. The system features a new dual loadlock cassette module with full factory automation capability to meet the high throughput requirements of high volume automated eight inch wafer fabs. This dual loadlock cassette handler permits continuous operation of the process chamber with one loadlock, while a second loadlock is simultaneously being loaded or unloaded by the operator in the cleanroom.ドキュメント
ドキュメントなし