説明
説明なし構成
• Currently configured for 200mm (8 in) wafer sizes • MFG Date: 2013 • Install Type: Stand-Alone • CE Mark Certified • Electrical Requirements : 208V • Serial Numbers: DLCM : DLCM-104 Module A : ALT-122 Module B : ALT-123 Module C : NA • Wafer specification: o Size: 200mm o Shape: SNNF (Semi Notch, no flat) • DLCM: o DLCM Type: DLCM-S o Robot: Brooks Mag-7 o Signal Lamp Tower o Module Controller: MC1 o GEMS o Integrated SMIF : Yes SMIF Loader Make/Model : Asyst / LPT2200 • Process Module: o Process Type: Altus-S Tungsten CVD/PNL o Altis Chamber Items o PNL Hardware : Yes B2H6 MFC : Yes o Gate Valve Mfg & Model : VAT o RF Generator: (2) AE RFG-3000 • Gas Pallet: Gas Line # Gas Flow (sccm) MFC Mfgr. MFC Model 1 AR(D) 5000 AERA 9800 2 SIH4(D) 250 AERA 9800 3 H2 20000 AERA 9800 4 AR(W) 20000 AERA 9800 5 WF6(W) 750 AERA 9800 6 C2F6 2000 AERA 9800 7 O2 2000 AERA 9800 8 AR(C) 10000 AERA 9800 9 H2 20000 AERA 9800 10 AY(Y) 10000 AERA 9800 11 B2H6(D) 500 AERA 9800 12 AR(J) 10000 AERA 9800 13 AR(H) 20000 AERA 9800 14 WF6(J) 500 AERA 9800 15 SIH4(X) 250 AERA 9800 16 N2(W) 250 AERA 9800 17 AR(X) 10000 AERA 9800 18 B2H6(X) 400 AERA 9800 19 WF6(Y) 500 AERA 9800 • Dry Pumps: o Load Lock Pump: Alcatel ADP122 o Transfer Chamber Pump: Alcatel ADP122 o Chamber Pump: Alcatel ADP1202/ADP122 • RF Generator Rack : Yes • SSD : Yes • Gas Abatement: Not included • Damage / Missing Parts: o None Reported, Please inspect to confirmOEMモデルの説明
Novellus introduced the Concept Two-Dual ALTUS tungsten deposition system in 1994. The Dual ALTUS is designed with a dual-chamber configuration that delivers the throughput power to dramatically lower the cost of tungsten deposition. It is considered the best solution in the industry for very high volume 200mm wafer fabs producing state-of-the-art 0.35um semiconductor devices.ドキュメント
ドキュメントなし
LAM RESEARCH / NOVELLUS
CONCEPT TWO "C2" DUAL ALTUS
検証済み
カテゴリ
MOCVD
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
23776
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2013
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
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LAM RESEARCH / NOVELLUS
CONCEPT TWO "C2" DUAL ALTUS
検証済み
カテゴリ
MOCVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
23776
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2013
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
• Currently configured for 200mm (8 in) wafer sizes • MFG Date: 2013 • Install Type: Stand-Alone • CE Mark Certified • Electrical Requirements : 208V • Serial Numbers: DLCM : DLCM-104 Module A : ALT-122 Module B : ALT-123 Module C : NA • Wafer specification: o Size: 200mm o Shape: SNNF (Semi Notch, no flat) • DLCM: o DLCM Type: DLCM-S o Robot: Brooks Mag-7 o Signal Lamp Tower o Module Controller: MC1 o GEMS o Integrated SMIF : Yes SMIF Loader Make/Model : Asyst / LPT2200 • Process Module: o Process Type: Altus-S Tungsten CVD/PNL o Altis Chamber Items o PNL Hardware : Yes B2H6 MFC : Yes o Gate Valve Mfg & Model : VAT o RF Generator: (2) AE RFG-3000 • Gas Pallet: Gas Line # Gas Flow (sccm) MFC Mfgr. MFC Model 1 AR(D) 5000 AERA 9800 2 SIH4(D) 250 AERA 9800 3 H2 20000 AERA 9800 4 AR(W) 20000 AERA 9800 5 WF6(W) 750 AERA 9800 6 C2F6 2000 AERA 9800 7 O2 2000 AERA 9800 8 AR(C) 10000 AERA 9800 9 H2 20000 AERA 9800 10 AY(Y) 10000 AERA 9800 11 B2H6(D) 500 AERA 9800 12 AR(J) 10000 AERA 9800 13 AR(H) 20000 AERA 9800 14 WF6(J) 500 AERA 9800 15 SIH4(X) 250 AERA 9800 16 N2(W) 250 AERA 9800 17 AR(X) 10000 AERA 9800 18 B2H6(X) 400 AERA 9800 19 WF6(Y) 500 AERA 9800 • Dry Pumps: o Load Lock Pump: Alcatel ADP122 o Transfer Chamber Pump: Alcatel ADP122 o Chamber Pump: Alcatel ADP1202/ADP122 • RF Generator Rack : Yes • SSD : Yes • Gas Abatement: Not included • Damage / Missing Parts: o None Reported, Please inspect to confirmOEMモデルの説明
Novellus introduced the Concept Two-Dual ALTUS tungsten deposition system in 1994. The Dual ALTUS is designed with a dual-chamber configuration that delivers the throughput power to dramatically lower the cost of tungsten deposition. It is considered the best solution in the industry for very high volume 200mm wafer fabs producing state-of-the-art 0.35um semiconductor devices.ドキュメント
ドキュメントなし
同様のリスト
すべて表示同様のリストが見つかりません