説明
説明なし構成
Veeco Propel spare parts: -Vincent furnace - Type HBM-650G -Scrubber, GNBS Engineering - Model NSGB 1.32 -Process pump - EBARA ESA25XW -Loadlock pump - EBARA EV-S20P -Big heater - tbd -Transformer Eaton. D 380-22.8A / Y 208-120 -Metal particle filters (3x). -Bubbler chillers. SMC INR-244-753 (3x) -Chiller. SMC, type HRB4009Z-X009 -Carrier (graphite, 6”). 1269329-5160-87, ± 20x -Seals, Part 1120076, 5x -Spindle, Quartz, Part 1236247, x2 -Susceptors, 150mm x10 -TPL Quartz crucible, 14X9.5-AS, + lab consumables -Platen 6”, 2013977-02, x3 -Carriers, 200 mm, new, Part 1254998-501300, x20. OEM newOEMモデルの説明
Veeco’s Propel™ MOCVD system is designed as a flexible platform for early stage research and development and small production needs for nitride applications. The reactor is capable of processing 9×2”, 3×4”, 1×6” and 1×8” on various substrates such as silicon, sapphire and silicon carbide without any hardware modification between runs.The system deposits high-quality GaN films for multiple applications such as power, RF, & photonics. The R200 reactor is based on Veeco’s leading TurboDisc® design including the IsoFlange™ and SymmHeat™ technologies that provide laminar flow and uniform temperature profile across the entire wafer. Customers can easily transfer processes from Veeco D180, K465i™ or MaxBright™ systems to the Propel GaN MOCVD platform.ドキュメント
ドキュメントなし
VEECO
Propel
検証済み
カテゴリ
MOCVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Parts Tool
稼働ステータス:
不明
製品ID：
102262
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
VEECO
Propel
カテゴリ
MOCVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Parts Tool
稼働ステータス:
不明
製品ID：
102262
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Veeco Propel spare parts: -Vincent furnace - Type HBM-650G -Scrubber, GNBS Engineering - Model NSGB 1.32 -Process pump - EBARA ESA25XW -Loadlock pump - EBARA EV-S20P -Big heater - tbd -Transformer Eaton. D 380-22.8A / Y 208-120 -Metal particle filters (3x). -Bubbler chillers. SMC INR-244-753 (3x) -Chiller. SMC, type HRB4009Z-X009 -Carrier (graphite, 6”). 1269329-5160-87, ± 20x -Seals, Part 1120076, 5x -Spindle, Quartz, Part 1236247, x2 -Susceptors, 150mm x10 -TPL Quartz crucible, 14X9.5-AS, + lab consumables -Platen 6”, 2013977-02, x3 -Carriers, 200 mm, new, Part 1254998-501300, x20. OEM newOEMモデルの説明
Veeco’s Propel™ MOCVD system is designed as a flexible platform for early stage research and development and small production needs for nitride applications. The reactor is capable of processing 9×2”, 3×4”, 1×6” and 1×8” on various substrates such as silicon, sapphire and silicon carbide without any hardware modification between runs.The system deposits high-quality GaN films for multiple applications such as power, RF, & photonics. The R200 reactor is based on Veeco’s leading TurboDisc® design including the IsoFlange™ and SymmHeat™ technologies that provide laminar flow and uniform temperature profile across the entire wafer. Customers can easily transfer processes from Veeco D180, K465i™ or MaxBright™ systems to the Propel GaN MOCVD platform.ドキュメント
ドキュメントなし