Oxford Instruments Plasmalab System 100 , PECVD , System 100 ICP180

PlasmaLab system 100 PECVD (Plasma Enhanced Chemical Vapour Deposition), made by Oxford Instruments, is a multipurpose tool capable of depositing silicon oxide, silicon nitride, amorphous silicon, and other films (under staff permission). Machine is controlled by a PC2000 software.

The device is disassembled and stored in a warm and dry warehouse.

USED, IN GOOD VISUAL CONDITION, NOT TESTED.

OXFORD

The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces

OXFORD

PLASMALAB 100 PECVD

PECVD

同様のリスト

OXFORD

PLASMALAB 100 PECVD

OXFORD

PLASMALAB 100 PECVD

OXFORD

PLASMALAB 100 PECVD

OXFORD

PLASMALAB 100 PECVD

OXFORD

PLASMALAB 100 PECVD

OXFORD

PLASMALAB 100 PECVD

OXFORD

PLASMALAB 100 PECVD

OXFORD

PLASMALAB 100 PECVD

PLASMALAB 100 PECVD

PECVD

同様のリスト

OXFORD

PLASMALAB 100 PECVD

OXFORD

PLASMALAB 100 PECVD

OXFORD

PLASMALAB 100 PECVD

OXFORD

PLASMALAB 100 PECVD

OXFORD

PLASMALAB 100 PECVD

OXFORD

PLASMALAB 100 PECVD

OXFORD

PLASMALAB 100 PECVD

OXFORD

PLASMALAB 100 PECVD