説明
説明なし構成
ICP PlasmaLab System100 ICP180 Etcher Configuration Details - Main System: 1) ICP process chamber with 200mm pumping port, single viewport 2) 200mm pumping tee with 200mm branch to sealable APC (for use with ATH1300MT or ATH1600MT process turbo pump) 3) System console 3 frame, PC base unit, Windows 7, 17" TFT, blue plc, PC2000 single chamber software 4) SEMI S2 and UL compliant 208V 60 Hz System power box 5) Electrical heating kit for ICP180 process chamber walls (no spacer) 6) RIE 205mm, wafer clamping, fixed height fluid heated/cooled aluminum RF powerable lower electrode, with removable top plate, 3 pin lift, helium assisted heat transfer 7) 600W, 13.56MHz RF Generator & Vacuum capacitor Automatch Unit for RIE 205mm electrode (Necessary for Ni Etch) 8) 2 x Liner kit for ICP180 Chamber 9) ICP180 Source (Alumina) with 3kW, 13.56MHz RF Generator, Vacuum capacitor Automatch Unit 11) Pumpdown pipe heating kit (200mm fixed height pumping tee) 12) Alcatel ATH1300MT/100 corrosive compatible magnetic bearing turbomolecular pump 13) Integration hardware for ATH1300MT turbomolecular pump 14) Heated backing valve kit for turbos 15) 8 line (MAX 8 Lines) externally mounted gas pod 16) 3 x Non-toxic gas line excluding mass flow controller 17) 3 x MKS 1179A MFC with viton seals for non-corrosive applications Item 16 & 17 - For Ar, CF4 & O2 18) 3 x Toxic gas line with MFC bypass, excluding mass flow controller 19) 3 x MKS 1479A MFC with metal seals for corrosive applications Itm3 18 & 19 - For BCI3, CI2 & HBr 20) Gas pod support frame for system frame mounting (end mounted power box layout only) 21) 208V Heated Gas Kit - required for SiCI4, BCI3, and C4F8 22) Adixen ADP122P 208V 60Hz Dry pump for turbo backing (No purge kit required) 23) Integration hardware for ADP122P dry pump 24) Adixen ADP/ADS Dry Pump Display 25) 100mm Substrate quartz clamp, tab contact 26) Julabo FC1600T 230V 60Hz 1PH HTR/CHILLER 0/80°C 27) FLUID H5S THERMAL 10L 28) CHILLER POWER CABLE 29) Single wafer automatic insertion load lock including support frame and active Pirani gauge 30) Adixen ACP15G Load lock dry pump 31) Integration hardware for ACP15G dry pump, including flexible tubing 32) Ocean Optics CCD1 UV/VIS CCD SpectrometerOEMモデルの説明
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small piecesドキュメント
ドキュメントなし
OXFORD
PLASMALAB 100
検証済み
カテゴリ
PECVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Idle
製品ID：
81944
ウェーハサイズ：
不明
ヴィンテージ：
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
OXFORD
PLASMALAB 100
カテゴリ
PECVD
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Idle
製品ID：
81944
ウェーハサイズ：
不明
ヴィンテージ：
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
ICP PlasmaLab System100 ICP180 Etcher Configuration Details - Main System: 1) ICP process chamber with 200mm pumping port, single viewport 2) 200mm pumping tee with 200mm branch to sealable APC (for use with ATH1300MT or ATH1600MT process turbo pump) 3) System console 3 frame, PC base unit, Windows 7, 17" TFT, blue plc, PC2000 single chamber software 4) SEMI S2 and UL compliant 208V 60 Hz System power box 5) Electrical heating kit for ICP180 process chamber walls (no spacer) 6) RIE 205mm, wafer clamping, fixed height fluid heated/cooled aluminum RF powerable lower electrode, with removable top plate, 3 pin lift, helium assisted heat transfer 7) 600W, 13.56MHz RF Generator & Vacuum capacitor Automatch Unit for RIE 205mm electrode (Necessary for Ni Etch) 8) 2 x Liner kit for ICP180 Chamber 9) ICP180 Source (Alumina) with 3kW, 13.56MHz RF Generator, Vacuum capacitor Automatch Unit 11) Pumpdown pipe heating kit (200mm fixed height pumping tee) 12) Alcatel ATH1300MT/100 corrosive compatible magnetic bearing turbomolecular pump 13) Integration hardware for ATH1300MT turbomolecular pump 14) Heated backing valve kit for turbos 15) 8 line (MAX 8 Lines) externally mounted gas pod 16) 3 x Non-toxic gas line excluding mass flow controller 17) 3 x MKS 1179A MFC with viton seals for non-corrosive applications Item 16 & 17 - For Ar, CF4 & O2 18) 3 x Toxic gas line with MFC bypass, excluding mass flow controller 19) 3 x MKS 1479A MFC with metal seals for corrosive applications Itm3 18 & 19 - For BCI3, CI2 & HBr 20) Gas pod support frame for system frame mounting (end mounted power box layout only) 21) 208V Heated Gas Kit - required for SiCI4, BCI3, and C4F8 22) Adixen ADP122P 208V 60Hz Dry pump for turbo backing (No purge kit required) 23) Integration hardware for ADP122P dry pump 24) Adixen ADP/ADS Dry Pump Display 25) 100mm Substrate quartz clamp, tab contact 26) Julabo FC1600T 230V 60Hz 1PH HTR/CHILLER 0/80°C 27) FLUID H5S THERMAL 10L 28) CHILLER POWER CABLE 29) Single wafer automatic insertion load lock including support frame and active Pirani gauge 30) Adixen ACP15G Load lock dry pump 31) Integration hardware for ACP15G dry pump, including flexible tubing 32) Ocean Optics CCD1 UV/VIS CCD SpectrometerOEMモデルの説明
The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small piecesドキュメント
ドキュメントなし