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OXFORD PLASMALAB 100
    説明
    Working upon shutdown
    構成
    構成なし
    OEMモデルの説明
    The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces
    ドキュメント

    ドキュメントなし

    OXFORD

    PLASMALAB 100

    verified-listing-icon

    検証済み

    カテゴリ
    PECVD

    最終検証: 30日以上前

    主なアイテムの詳細

    状態:

    Parts Tool


    稼働ステータス:

    Deinstalled


    製品ID:

    113442


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    OXFORD PLASMALAB 100

    OXFORD

    PLASMALAB 100

    PECVD
    ヴィンテージ: 0状態: 中古
    最終確認15日前

    OXFORD

    PLASMALAB 100

    verified-listing-icon
    検証済み
    カテゴリ
    PECVD
    最終検証: 30日以上前
    listing-photo-da6cbec318514ba0a39ef407614d18f6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86645/da6cbec318514ba0a39ef407614d18f6/2b1f1e7c16a148d0a2f058f0ed7fb13d_c0f0faf7e137412e81c5f7394deb3b7c_mw.jpeg
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    listing-photo-da6cbec318514ba0a39ef407614d18f6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86645/da6cbec318514ba0a39ef407614d18f6/475a5d4b2c99454db70e53b9beed91e3_6ccee3b8bd84417a84868a0cd7f8f665_mw.jpeg
    主なアイテムの詳細

    状態:

    Parts Tool


    稼働ステータス:

    Deinstalled


    製品ID:

    113442


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    Working upon shutdown
    構成
    構成なし
    OEMモデルの説明
    The Oxford Plasmalab 100 is an inductively coupled plasma (ICP) etcher that is designed for multipurpose use. It is based on fluorocarbon and is capable of anisotropically etching silicon, silicon oxide, and other dielectric materials. The tool is equipped with a temperature-controlled electrode, which allows users to tailor their etch feature profiles. The manual load system can accommodate substrates of various sizes, ranging from 200mm diameter wafers down to small pieces
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    OXFORD PLASMALAB 100

    OXFORD

    PLASMALAB 100

    PECVDヴィンテージ: 0状態: 中古最終検証:15日前
    OXFORD PLASMALAB 100

    OXFORD

    PLASMALAB 100

    PECVDヴィンテージ: 0状態: 中古最終検証:60日以上前
    OXFORD PLASMALAB 100

    OXFORD

    PLASMALAB 100

    PECVDヴィンテージ: 0状態: 中古最終検証:6日前