SAMCO

PD-4800	

PD-3800

PD-3800L	

PD-270STLC

PD-100D

PD-3800LT

PD-2400L	

The PD-220NL is a loadlock plasma-enhanced chemical vapor deposition (PECVD) system capable of depositing silicon-based films (silicon oxide, silicon nitride, silicon oxynitride and amorphous silicon). This system offers all of the standard features for PECVD in a very compact footprint. Films with superior thickness uniformity and stress control can be deposited over a 220 mm diameter area with excellent stability and repeatability. This system is ideal for depositing thin films for R&D as well as for pilot production.

PD-220NL

PD-220

SAMCO

概要（Overview）

現在の掲載品

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トップSAMCO PECVD

PD-4800

PD-3800

PD-3800L

PD-270STLC

Moovに掲載品して、すぐに申し分ない購入者を見つけましょう。

すべてのSAMCO PECVD