ADTEC Engineering designs and builds technologically advanced products, which through extensive market research, adapt to our customers' requirements. Our advanced technology has been applied in various fields of the electronics industry, generating several unique product lines.

Direct imaging exposure system.
L/S = 12/12μm
MSAP
 40W
405 nm

ADTEC ENGINEERING

IP-12 6000

For circuit formation. Large Panel Model.

ADEX-5300P

Automatic Exposure System for Solder Resist

ANEX-A3161

ADEX-6000S

ADEX-3300S

Automatic Double-sided Simultaneous Exposure System for Internal Layers.

ADE-1300P

ADEX-5250S

Direct imaging exposure system.
L/S = 15/15μm
HDI
50W
405 nm

IP-15 UHT

Automatic Exposure System for Outer Layer Circuits for smaller boards

EV-2400

Direct imaging exposure system.
L/S = 15/15μm
HDI/MLB
45W/54W
405 nm

IP-15 L3800

ADEX-4000S

Direct Write Exposure System for FO-WLP/PLP. DE-8 W300 for 300mm (12”) Wafer.

DE-8 W300

Direct Imaging Exposure System for Circuit Formation  

IP-3600HH

ADEX-5300S

ADEX-5000S

A new rendering engine that is integrated with advanced lens design technology is on-board our proprietary laser unit. One-time scan was also realized by arranging high quality and output laser heads in line at the board width. High quality exposure without shifting and misalignment between heads is achieved.

 IP-15 5000UH

Direct imaging exposure system for PLP.
L/S = 2/2μm
FO-WLP/ FO-PLP/ Organic PKG
405 nm

DE-2 P600

Direct imaging exposure system.
L/S = 15/15μm
HDI
40W/50W
405 nm

IP-15 UHS

Contact type exposure system. Basic model.

EV-7100 (SR)

Direct Write Exposure System for FO-WLP/PLP. DE-8 P600 for 600 x 600mm Panel.

DE-8 P600

Direct imaging exposure system.
L/S = 35/35μm
MLB
45W(IP-35L1000H)
405 nm

IP-35L1000H

EV-7100 (PT)

Direct imaging exposure system. 
L/S = 4/4μm*
PKG
40W/50W
405 nm

IP-4

For circuit formation. Basic Model By LED.

ADEX-3300P-LED

Direct imaging exposure system.
L/S = 6/6μm
FPC
50W
405 nm

IP-6 HR

Automatic Double-sided Simultaneous Exposure System for Internal Layers

ADE-1200P

Roll to Roll Double-sided Simultaneous Exposure System.

AFLX-2600P

Direct imaging exposure system.
L/S = 10/10μm
MSAP
40W
405 nm

IP-10 7000

For circuit formation. Middle Range Model.

ADEX-4000P

The copy frame is structured so that it can be pulled out to the front of the system. The automatic film-mask mounting function makes mask replacement work easier than ever before. The previous process of securing the film mask by tape is no longer necessary. In addition, the top-side copy frame rotates to realize ease of maintainability, making this a user-friendly system.

ADEX-2300P

Direct imaging exposure system.
L/S = 35/35μm
MLB
40W(IP-35 1000)
405 nm

IP-35 1000

Direct imaging exposure system.
L/S = 2/2μm
FO-WLP/ FO-PLP/ Organic PKG
405 nm

DE-2 W300

Automatic Exposure System for Inner/Outer Layer Circuits 

ADEX-3000PV

ADEX-3300P

AFLX-2600P5

ADEX-2300PL

Direct imaging exposure system. 
L/S = 6/6μm
PKG
40W  
405 nm

IP-6 9000

Automatic Exposure System for Inner/Outer Layer Circuits.

ADEX-3000PB

ADEX-1300P

Direct Imaging Exposure System for Circuit Formation

IS-4000H

Direct imaging exposure system. 
L/S = 8/8μm
PKG
40W
405 nm

IP-8 8000

Automatic Exposure System for Inner/Outer Layer Circuits

ANEX-A2161	

Semi-Automatic Exposure System for Outer Layer Circuits for smaller boards.

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

ADTEC ENGINEERING

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トップADTEC ENGINEERING Photolithography

ADEX-5300P

ANEX-A3161

ADEX-6000S

IP-15 5000UH

Moovに掲載品して、すぐに申し分ない購入者を見つけましょう。

すべてのADTEC ENGINEERING Photolithography