説明
Used. Just taken offline in 2021/07 and not able to run the equipment now. If there are any questions or you need more info, please contact us.構成
1. Chamber: Aluminum, 600(ID) x 138(H)mm, chamber lid opening/closing by manual 2. Electrode: Parallel plate, cathode coupling electrodes 3. Substrate Heating: Resistive heater, Max. 400℃, PID controlled 4. Substrate Holder: 5 x Φ6", Aluminum carrier. (or 13 x 4" wafer) 5. RF Power: AE Cesar, 13.56MHz, Max. 1,000W, all solid state. 6. Gas Inlet Lines: 2 Mass Flow Controllers with metal sealed and bypass lines for 10%-(SiH4 / N2) and NH3. 4 Mass Flow Controllers for N2O, N2, CF4 and O2.OEMモデルの説明
提供なしドキュメント
ドキュメントなし
CELLO
AEGIS-60
検証済み
カテゴリ
Photolithography
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
47750
ウェーハサイズ:
不明
ヴィンテージ:
2014
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示同様のリストが見つかりません
CELLO
AEGIS-60
検証済み
カテゴリ
Photolithography
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
47750
ウェーハサイズ:
不明
ヴィンテージ:
2014
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Used. Just taken offline in 2021/07 and not able to run the equipment now. If there are any questions or you need more info, please contact us.構成
1. Chamber: Aluminum, 600(ID) x 138(H)mm, chamber lid opening/closing by manual 2. Electrode: Parallel plate, cathode coupling electrodes 3. Substrate Heating: Resistive heater, Max. 400℃, PID controlled 4. Substrate Holder: 5 x Φ6", Aluminum carrier. (or 13 x 4" wafer) 5. RF Power: AE Cesar, 13.56MHz, Max. 1,000W, all solid state. 6. Gas Inlet Lines: 2 Mass Flow Controllers with metal sealed and bypass lines for 10%-(SiH4 / N2) and NH3. 4 Mass Flow Controllers for N2O, N2, CF4 and O2.OEMモデルの説明
提供なしドキュメント
ドキュメントなし
同様のリスト
すべて表示同様のリストが見つかりません