説明
Inert Gas Oven構成
構成なしOEMモデルの説明
Ultratech Stepper Inc. has launched the Model 1500MVS, the latest addition to its well-established Model 1500 Lithography Series. The Model 1500MVS incorporates Ultratech’s machine vision system (MVS), which provides enhanced alignment flexibility that is not achievable using traditional alignment methods. As a pattern recognition alignment system, the MVS eliminates the need for larger scribe lines between dies to accommodate dedicated alignment targets, resulting in an increase in the number of net die-per-wafer. According to Ultratech, the Model 1500’s MVS capability enables it to recognize targets produced for any other lithography tool, thereby eliminating the need for dedicated targets and facilitating the implementation of mix-and-match strategies.ドキュメント
ドキュメントなし
VEECO / ULTRATECH
1500 MVS
検証済み
カテゴリ
Photolithography
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
44643
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示同様のリストが見つかりません
VEECO / ULTRATECH
1500 MVS
カテゴリ
Photolithography
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
44643
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Inert Gas Oven構成
構成なしOEMモデルの説明
Ultratech Stepper Inc. has launched the Model 1500MVS, the latest addition to its well-established Model 1500 Lithography Series. The Model 1500MVS incorporates Ultratech’s machine vision system (MVS), which provides enhanced alignment flexibility that is not achievable using traditional alignment methods. As a pattern recognition alignment system, the MVS eliminates the need for larger scribe lines between dies to accommodate dedicated alignment targets, resulting in an increase in the number of net die-per-wafer. According to Ultratech, the Model 1500’s MVS capability enables it to recognize targets produced for any other lithography tool, thereby eliminating the need for dedicated targets and facilitating the implementation of mix-and-match strategies.ドキュメント
ドキュメントなし
同様のリスト
すべて表示同様のリストが見つかりません