説明
EXPOSE TOOL, SIP構成
構成なしOEMモデルの説明
The UltraTech Saturn Spectrum 300 is a stepper system used in the fabrication of semiconductors. It can handle wafers that are between 8" and 12" in size and has a resolution of 2.0 microns. The system is equipped with a robotic wafer handler, an environmental chamber, and a reticle library, as well as a light pipe that measures 44 x 26.7 mm. The illuminator can be either 1000w or 1200w and the lens alignment is automatic with enhanced global alignment. Additionally, the UltraTech Saturn Spectrum 300 features an air probe focus detector, a 3-point focus detector, and a linear motor for the X and Y stage. It also includes an MVS pattern recognition system, a closed-loop exposure dose controller, a vibration isolation system, auto-uniformity, and dynamic focus. The system is SECS II compatible and has bottom-side prism protection pellicle, dual flip aperture broadband, an intensity of 1650mW, uniformity of 7%, and a DOF of 2µm.ドキュメント
ドキュメントなし
VEECO / ULTRATECH
SATURN SPECTRUM 300
検証済み
カテゴリ
Photolithography
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
111535
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
VEECO / ULTRATECH
SATURN SPECTRUM 300
カテゴリ
Photolithography
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
111535
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
EXPOSE TOOL, SIP構成
構成なしOEMモデルの説明
The UltraTech Saturn Spectrum 300 is a stepper system used in the fabrication of semiconductors. It can handle wafers that are between 8" and 12" in size and has a resolution of 2.0 microns. The system is equipped with a robotic wafer handler, an environmental chamber, and a reticle library, as well as a light pipe that measures 44 x 26.7 mm. The illuminator can be either 1000w or 1200w and the lens alignment is automatic with enhanced global alignment. Additionally, the UltraTech Saturn Spectrum 300 features an air probe focus detector, a 3-point focus detector, and a linear motor for the X and Y stage. It also includes an MVS pattern recognition system, a closed-loop exposure dose controller, a vibration isolation system, auto-uniformity, and dynamic focus. The system is SECS II compatible and has bottom-side prism protection pellicle, dual flip aperture broadband, an intensity of 1650mW, uniformity of 7%, and a DOF of 2µm.ドキュメント
ドキュメントなし