説明

De-installed Equipment usage and function description 12-inch wafer plasma reaction chambers Missing parts No

構成

Item Configuration Chamber DPSII RF System Bias generator V Source generator V bias match V HV module V Vacuum system Turbo pump V ISO valve V Pumping Line V Dual Gas feed system Gas line V ISO valve V EPD system Eye-D controller X Electric system AC distribute V DC power supply V Other Heater pad & ring V Source inner coil V Swap kits (9 pcs) V