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KLA 1530
    説明
    Temperature Monitoring
    構成
    構成なし
    OEMモデルの説明
    The Process Probe™ 1530 and 1535 instrumented wafers are used to monitor in situ temperatures for a wide range of processes, including cold wall, RTP, sputtering, CVD, plasma strippers and epitaxial reactors. The Process Probe 1530 and 1535 provide direct, real-time measurement of wafer temperature during each critical step of the process cycle. With this comprehensive temperature data, process engineers can characterize and fine tune process conditions, driving improved process equipment performance, wafer quality and yield. Process development, Process qualification, Process tool qualification, Process tool matching Cold wall thin film process chambers (1530), Hot wall thin film process chambers (1535) | 0-1100°C
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    KLA

    1530

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    検証済み

    カテゴリ
    Probers

    最終検証: 9日前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    91949


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明

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    同様のリスト
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    KLA 1530

    KLA

    1530

    Probers
    ヴィンテージ: 0状態: 中古
    最終確認9日前

    KLA

    1530

    verified-listing-icon
    検証済み
    カテゴリ
    Probers
    最終検証: 9日前
    listing-photo-0b4db008aabc419ab706d45753be46c9-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    91949


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    Temperature Monitoring
    構成
    構成なし
    OEMモデルの説明
    The Process Probe™ 1530 and 1535 instrumented wafers are used to monitor in situ temperatures for a wide range of processes, including cold wall, RTP, sputtering, CVD, plasma strippers and epitaxial reactors. The Process Probe 1530 and 1535 provide direct, real-time measurement of wafer temperature during each critical step of the process cycle. With this comprehensive temperature data, process engineers can characterize and fine tune process conditions, driving improved process equipment performance, wafer quality and yield. Process development, Process qualification, Process tool qualification, Process tool matching Cold wall thin film process chambers (1530), Hot wall thin film process chambers (1535) | 0-1100°C
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    KLA 1530

    KLA

    1530

    Probersヴィンテージ: 0状態: 中古最終検証: 9日前