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ATC 1800 UHV
カテゴリ
PVD / Sputtering概要（Overview）
ATC 1800 UHV. (5) con-focal A320-XP 2" UHV sputter sources with in-situ tilt, (1) normal incidence A330-XP-3” UHV sputtering source for high rate applications, CTI-8 cryopump, 850°C rotating substrate heater with RF bias, computer control & load-lock for 100 mm Ø substrates.
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