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NIMBUS
カテゴリ
PVD / Sputtering概要（Overview）
The Nimbus is a high throughput sputter deposition system. The unique and patented architecture incorporates the essential process steps in three vacuum chambers linked by a unique substrate transport system. This small footprint system, with ease of maintenance designed in, stands out in the market as providing outstanding cost of ownership. There are three models: Nimbus 250 - manual system for development and low volume production Nimbus 300 - robotic wafer handling 100 to 200 mm (in production) Nimbus 350 - 200 and 300 mm with either FOUP or SMIF interface
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