System configuration: Cluster type (up to three process chambers) C to C type
Substrate size: φ200mm maximum
Cathode: φ7.1" cathode (Up to 4. Varies depending on the module.)

Modules:
Offset rotary sputtering module (multi-cathode specification)
Offset rotary and revolutionary sputtering module
Etching module (preprocessing)
Preheating module (preprocessing)

CANON acquired ANELVA and became CANON ANELVA Corporation which focuses on: Vacuum thin-film deposition and processing equipment, semiconductor device manufacturing equipment, storage device manufacturing equipment, equipment for electronic device manufacturing and for R&D, maintenance service, and vacuum components.


EC7400

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