The Eclipse Mark IV is the latest generation PVD tool from the highly successful Eclipse family. It offers the lowest Cost-of-Ownership through high throughput, a small footprint, and high reliability with exceptional process performance. The system achieves high throughput in a high vacuum environment through the use of serial wafer handling, resulting in 80% fewer wafer transfers than a traditional cluster tool. The Eclipse Mark IV has a footprint of 44 square feet and can be configured for etch or deposition, providing full capability for today’s contact, barrier, interconnect, resistor, and packaging films for Silicon, GaAs and CCD substrates. Wafer temperature is regulated by backplane heaters and the chambers have world class vacuum leak rates and base pressures.

TEL / MRC

ECLIPSE MARK IV

The Eclipse Mark II is a process that uses hot aluminum (Al) for contact and via plug. The via plug is processed at a temperature of 450°C. The process also involves the deposition of a barrier metal.

ECLIPSE MARK II

The Eclipse-Star is an in-line sputtering system. It has been improved by converting the platform to a three- or four (optional)-stage vacuum design and incorporating a degas station to provide ultrahigh-vacuum processing in the deposition chamber.

TEL / MRC

概要（Overview）

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トップTEL / MRC PVD / Sputtering

ECLIPSE MARK II

ECLIPSE MARK IV

ECLIPSE STAR

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すべてのTEL / MRC PVD / Sputtering