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LAM RESEARCH CORPORATION TCP 9600
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    TCP 9600 is a high-density, low-pressure system from Lam’s TCP product line. It was introduced in late 1992 and incorporates the Company’s patented Transformer Coupled Plasma-TM- source technology for etching 0.35 micron and smaller geometries. The TCP 9600 series is designed for metal etch applications and is used to produce a broad range of advanced logic and memory devices. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates, with independent power control to the lower electrode. This improves etch results across a wider process window and offers customers a reliable, lower cost of ownership solution to their advanced needs.
    ドキュメント

    ドキュメントなし

    LAM RESEARCH CORPORATION

    TCP 9600

    verified-listing-icon

    検証済み

    カテゴリ

    RIE
    最終検証: 30日以上前
    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    100388


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明

    Have Additional Questions?
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    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
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    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION TCP 9600
    LAM RESEARCH CORPORATIONTCP 9600RIE
    ヴィンテージ: 0状態: 改修済み
    最終確認30日以上前

    LAM RESEARCH CORPORATION

    TCP 9600

    verified-listing-icon

    検証済み

    カテゴリ

    RIE
    最終検証: 30日以上前
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    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    100388


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    TCP 9600 is a high-density, low-pressure system from Lam’s TCP product line. It was introduced in late 1992 and incorporates the Company’s patented Transformer Coupled Plasma-TM- source technology for etching 0.35 micron and smaller geometries. The TCP 9600 series is designed for metal etch applications and is used to produce a broad range of advanced logic and memory devices. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates, with independent power control to the lower electrode. This improves etch results across a wider process window and offers customers a reliable, lower cost of ownership solution to their advanced needs.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION TCP 9600
    LAM RESEARCH CORPORATION
    TCP 9600
    RIEヴィンテージ: 0状態: 改修済み最終検証: 30日以上前