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APPLIED MATERIALS (AMAT) VANTAGE RADIANCE
    説明
    説明なし
    構成
    Applied Materials Vantage Radiance RTP Field audit attached
    OEMモデルの説明
    The Applied Vantage Radiance RTP is a dedicated, two-chamber rapid thermal processing (RTP) solution for 300mm high-volume chip manufacturing. The Vantage system combines world-class Radiance 300mm RTP technology with a streamlined platform design to deliver industry-leading productivity and cost of ownership for 300mm volume manufacturing. The Vantage Radiance RTP interfaces up to two process chambers directly to the factory interface and track robot. Vantage maintains a <1 ppm oxygen ambient for critical anneals without the use of a mainframe or loadlock. The system supports all atmospheric annealing applications, including implant annealing, spike annealing and salicidation, as well as dry rapid thermal oxidation. Radiance chamber performance is equivalent to that on a Centura cluster tool, and Radiance technology and enhancements provide Vantage extendability to <90nm nodes. Mechanical throughput of the system exceeds 100 wafers per hour due to its simplified wafer transfer sequencing. Chipmakers quickly install and qualify the system as Vantage is delivered as a single, integrated unit. The Vantage platform has also demonstrated ease of maintenance and high reliability in volume production.
    ドキュメント

    APPLIED MATERIALS (AMAT)

    VANTAGE RADIANCE

    verified-listing-icon

    検証済み

    カテゴリ
    RTP/RTA

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    82977


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) VANTAGE RADIANCE

    APPLIED MATERIALS (AMAT)

    VANTAGE RADIANCE

    RTP/RTA
    ヴィンテージ: 2002状態: 中古
    最終確認30日以上前

    APPLIED MATERIALS (AMAT)

    VANTAGE RADIANCE

    verified-listing-icon
    検証済み
    カテゴリ
    RTP/RTA
    最終検証: 60日以上前
    listing-photo-2522732f9df145369a5a08bcecbd4f36-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45732/2522732f9df145369a5a08bcecbd4f36/1b495dbcd0434b35bae4fa98d921db9c_ff73cc6ed53240c89f7398099152c49f1201a_mw.jpeg
    listing-photo-2522732f9df145369a5a08bcecbd4f36-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45732/2522732f9df145369a5a08bcecbd4f36/f87093c5fd184b9b831637b77f048ec6_cc80139253034dc2bb7dc8b2766d89cc_mw.jpeg
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    listing-photo-2522732f9df145369a5a08bcecbd4f36-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45732/2522732f9df145369a5a08bcecbd4f36/540f3eb3d2a5411f9dd9ea99ae366375_2a0f9037e6fe426fb9bab7ae435dc4ac1201a_mw.jpeg
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    listing-photo-2522732f9df145369a5a08bcecbd4f36-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45732/2522732f9df145369a5a08bcecbd4f36/aa73109eb545495a8f7582cae5878db9_c3edd99aa77f4e78a7375612ae2b388a_mw.jpeg
    listing-photo-2522732f9df145369a5a08bcecbd4f36-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45732/2522732f9df145369a5a08bcecbd4f36/43d9a93c6cb14733a8e77983b7d3c093_4772e5e84df5474eb07d9b22bbc2bbd7_mw.jpeg
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    82977


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    Applied Materials Vantage Radiance RTP Field audit attached
    OEMモデルの説明
    The Applied Vantage Radiance RTP is a dedicated, two-chamber rapid thermal processing (RTP) solution for 300mm high-volume chip manufacturing. The Vantage system combines world-class Radiance 300mm RTP technology with a streamlined platform design to deliver industry-leading productivity and cost of ownership for 300mm volume manufacturing. The Vantage Radiance RTP interfaces up to two process chambers directly to the factory interface and track robot. Vantage maintains a <1 ppm oxygen ambient for critical anneals without the use of a mainframe or loadlock. The system supports all atmospheric annealing applications, including implant annealing, spike annealing and salicidation, as well as dry rapid thermal oxidation. Radiance chamber performance is equivalent to that on a Centura cluster tool, and Radiance technology and enhancements provide Vantage extendability to <90nm nodes. Mechanical throughput of the system exceeds 100 wafers per hour due to its simplified wafer transfer sequencing. Chipmakers quickly install and qualify the system as Vantage is delivered as a single, integrated unit. The Vantage platform has also demonstrated ease of maintenance and high reliability in volume production.
    ドキュメント
    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) VANTAGE RADIANCE

    APPLIED MATERIALS (AMAT)

    VANTAGE RADIANCE

    RTP/RTAヴィンテージ: 2002状態: 中古最終検証:30日以上前
    APPLIED MATERIALS (AMAT) VANTAGE RADIANCE

    APPLIED MATERIALS (AMAT)

    VANTAGE RADIANCE

    RTP/RTAヴィンテージ: 2006状態: 中古最終検証:60日以上前
    APPLIED MATERIALS (AMAT) VANTAGE RADIANCE

    APPLIED MATERIALS (AMAT)

    VANTAGE RADIANCE

    RTP/RTAヴィンテージ: 0状態: 中古最終検証:60日以上前