説明
Applied Materials Centura HT -RTP (Metal)構成
2 Chambers RTP XE, 2 Cool Down Dual Chamber RTPOEMモデルの説明
The Centura RTP is a rapid thermal processing system offered by the Thermal Processing Organization. It is one of the most successful systems in the industry and has been recognized as the best-selling RTP system in the world by VLSI Research and Dataquest. The system is noted for its superb temperature control, performing standalone and integrated rapid thermal processing for silicide and implant anneal, oxidation, and nitridation for logic and DRAM devices down to 0.18mm. The RTP Centura’s industry-leading within-wafer and wafer-to-wafer uniformity provides dramatically successful uniformity of 5°C, 3s. Superior temperature control is also provided by the unique patented Honeycomb Source lamp module and emissivity-independent Emissometer temperature measurement tool. In addition to RTP processes, the Thermal Processing Organization also offers other high-temperature depositions such as integrated polysilicon, tungsten silicide, and silicon nitride.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT)
CENTURA RTP
検証済み
カテゴリ
RTP/RTA
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
93182
ウェーハサイズ：
不明
ヴィンテージ：
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA RTP
カテゴリ
RTP/RTA
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
93182
ウェーハサイズ：
不明
ヴィンテージ：
1997
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Applied Materials Centura HT -RTP (Metal)構成
2 Chambers RTP XE, 2 Cool Down Dual Chamber RTPOEMモデルの説明
The Centura RTP is a rapid thermal processing system offered by the Thermal Processing Organization. It is one of the most successful systems in the industry and has been recognized as the best-selling RTP system in the world by VLSI Research and Dataquest. The system is noted for its superb temperature control, performing standalone and integrated rapid thermal processing for silicide and implant anneal, oxidation, and nitridation for logic and DRAM devices down to 0.18mm. The RTP Centura’s industry-leading within-wafer and wafer-to-wafer uniformity provides dramatically successful uniformity of 5°C, 3s. Superior temperature control is also provided by the unique patented Honeycomb Source lamp module and emissivity-independent Emissometer temperature measurement tool. In addition to RTP processes, the Thermal Processing Organization also offers other high-temperature depositions such as integrated polysilicon, tungsten silicide, and silicon nitride.ドキュメント
ドキュメントなし