The LSM 510 has been designed, built and tested in conformity with the standards DIN EN 61010-1 (IEC 1010-1) "Safety requirements for electrical instrumentation and control and laboratory apparatus", and DIN EN 60825-1 (IEC publication 825-1) "Safety of laser equipment", and taking relevant CSA and UL specifications into account.

ZEISS is the global technology leader in the production of systems and modules for microchip production. With semiconductor manufacturing optics, photomask systems and process control solutions, ZEISS supplies key technologies for the production of ultra-fine conductor track structures on silicon wafers – the raw material used to make microchips. Advances in computer technology largely rely on the ongoing development of optical lithography – every new generation enables even finer structures to be produced on the microchips. This makes circuits more compact, resulting in more powerful and more energy-efficient microchips every year. ZEISS has been driving the development of semiconductor manufacturing technology right from day one. ZEISS’ new and unique extreme ultraviolet (EUV) lithography has created a series of further generations of microchips with ever greater integration density and performance.

ZEISS / CARL ZEISS

LSM 510

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LSM 510

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