説明
PVD / Sputter Missing Part: HDD構成
FI:5.3 FI Robot: KAWASAKI FIS: 0190-22269 FES: 0190-17956 Buffer & Xfer Robot: XP Robot Ch-1: NA Ch-2: Ti, DC Power Supply: ENI DCG-200E OPTIMA Ch-3: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-4: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-5: NA Ch-A: Pass Ch-B: Cool Ch-C: PC-XT RF Generator: COMDEL CDX-2000 Ch-D: PC-XT RF Generator: COMDEL CDX-2000 Ch-E: Degas (Single Heat) Ch-F: Degas (Single Heat) Cryo Compressor: CTI IS-1000 x2setOEMモデルの説明
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT)
ENDURA II
検証済み
カテゴリ
PVD / Sputtering
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
44740
ウェーハサイズ:
12"/300mm
ヴィンテージ:
2006
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Logistics Support
Available
Money Back Guarantee
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Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示APPLIED MATERIALS (AMAT)
ENDURA II
検証済み
カテゴリ
PVD / Sputtering
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
44740
ウェーハサイズ:
12"/300mm
ヴィンテージ:
2006
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
PVD / Sputter Missing Part: HDD構成
FI:5.3 FI Robot: KAWASAKI FIS: 0190-22269 FES: 0190-17956 Buffer & Xfer Robot: XP Robot Ch-1: NA Ch-2: Ti, DC Power Supply: ENI DCG-200E OPTIMA Ch-3: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-4: TiN DC Power Supply: ENI DCG-200E OPTIMA Ch-5: NA Ch-A: Pass Ch-B: Cool Ch-C: PC-XT RF Generator: COMDEL CDX-2000 Ch-D: PC-XT RF Generator: COMDEL CDX-2000 Ch-E: Degas (Single Heat) Ch-F: Degas (Single Heat) Cryo Compressor: CTI IS-1000 x2setOEMモデルの説明
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.ドキュメント
ドキュメントなし