説明
説明なし構成
Software Version: 8.1.0 Includes Option File: - PEP 2 (Color Graphics) - PEP 1/3/4 - Extended Filesystem (MEP) - Reticle Error Correction - Throughput Enhancement - Batch Status Light - 88 um Error Detection - Chuckspot Detection - Wafer Tilt MonitorOEMモデルの説明
The PAS 5000/55A steppers feature a 0.48NA i-Line lens with a 21.2mm field, optimized for 0.5µm resolutions across IC productions and substrates like Silicon to GaAs. It boasts superior overlay performance due to its fast linear-electric exposure stage and phase grating alignment system. User-friendly software streamlines metrology tests in multi-stepper setups, promoting design rule optimization and enhanced yield. With only two alignment marks required, alignment time is minimized. Its swift stage and lack of need for send-ahead wafers guarantee peak productivity and precision. Additionally, it integrates a SMIF-compatible, high-speed reticle management system.ドキュメント
ドキュメントなし
ASML
PAS 5000/55
検証済み
カテゴリ
Steppers & Scanners
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
112208
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5000/55
カテゴリ
Steppers & Scanners
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
112208
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Software Version: 8.1.0 Includes Option File: - PEP 2 (Color Graphics) - PEP 1/3/4 - Extended Filesystem (MEP) - Reticle Error Correction - Throughput Enhancement - Batch Status Light - 88 um Error Detection - Chuckspot Detection - Wafer Tilt MonitorOEMモデルの説明
The PAS 5000/55A steppers feature a 0.48NA i-Line lens with a 21.2mm field, optimized for 0.5µm resolutions across IC productions and substrates like Silicon to GaAs. It boasts superior overlay performance due to its fast linear-electric exposure stage and phase grating alignment system. User-friendly software streamlines metrology tests in multi-stepper setups, promoting design rule optimization and enhanced yield. With only two alignment marks required, alignment time is minimized. Its swift stage and lack of need for send-ahead wafers guarantee peak productivity and precision. Additionally, it integrates a SMIF-compatible, high-speed reticle management system.ドキュメント
ドキュメントなし