説明
説明なし構成
The cymer laser is EOL. Asset Description: 193nm ASML Immersion scanner Software Version: 5.1 CIM: SECS Process: 40/45nm backend Main System main body 1 OK CYMER laser 1 OK MCWC 1 OK main body 1 OK WISR 1 OK WICR 1 OK flter cabinet 1 OK LCWC 1 OK ACC 1 OKOEMモデルの説明
The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below.ドキュメント
ドキュメントなし
ASML
TWINSCAN XT:1900Gi
検証済み
カテゴリ
Steppers & Scanners
最終検証: 16日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
105053
ウェーハサイズ:
12"/300mm
ヴィンテージ:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示ASML
TWINSCAN XT:1900Gi
カテゴリ
Steppers & Scanners
最終検証: 16日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
105053
ウェーハサイズ:
12"/300mm
ヴィンテージ:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
The cymer laser is EOL. Asset Description: 193nm ASML Immersion scanner Software Version: 5.1 CIM: SECS Process: 40/45nm backend Main System main body 1 OK CYMER laser 1 OK MCWC 1 OK main body 1 OK WISR 1 OK WICR 1 OK flter cabinet 1 OK LCWC 1 OK ACC 1 OKOEMモデルの説明
The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below.ドキュメント
ドキュメントなし