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ASML TWINSCAN XT:400G
    説明
    i-Line Scanner
    構成
    構成なし
    OEMモデルの説明
    The TWINSCAN XT:400G 365-nm Step-and-Scan system is an ultra high-productivity, dual-stage lithography tool designed for volume 300-mm wafer production at 350-nm resolution. The dual wafer-stage technology of the TWINSCAN platform enables the exposure of one wafer and the alignment and mapping of the next wafer to take place in parallel, thereby virtually eliminating overhead time and allowing for continuous patterning of wafers.
    ドキュメント

    ドキュメントなし

    ASML

    TWINSCAN XT:400G

    verified-listing-icon

    検証済み

    カテゴリ
    Steppers & Scanners

    最終検証: 19日前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    91663


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    ASML TWINSCAN XT:400G

    ASML

    TWINSCAN XT:400G

    Steppers & Scanners
    ヴィンテージ: 0状態: 中古
    最終確認19日前

    ASML

    TWINSCAN XT:400G

    verified-listing-icon
    検証済み
    カテゴリ
    Steppers & Scanners
    最終検証: 19日前
    listing-photo-09818909b0b94f79a108631954699fc3-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    91663


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    i-Line Scanner
    構成
    構成なし
    OEMモデルの説明
    The TWINSCAN XT:400G 365-nm Step-and-Scan system is an ultra high-productivity, dual-stage lithography tool designed for volume 300-mm wafer production at 350-nm resolution. The dual wafer-stage technology of the TWINSCAN platform enables the exposure of one wafer and the alignment and mapping of the next wafer to take place in parallel, thereby virtually eliminating overhead time and allowing for continuous patterning of wafers.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    ASML TWINSCAN XT:400G

    ASML

    TWINSCAN XT:400G

    Steppers & Scannersヴィンテージ: 0状態: 中古最終検証:19日前