概要（Overview）

ASML's TWINSCAN XT:860M is designed using state-of-the-art optics for volume 300 mm wafer production at and below 110 nm resolution. The TWINSCAN XT:860M step-and-scan system is a high-productivity, dual-stage KrF lithography machine designed for volume production of 300 mm wafers at below 110 nm resolution.