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説明
NIKON DUV STEPPER構成
-Software Version: MCSV E3.42, OCSV E3.42, -CIM: SECS -Process: Lithography Exposure Step and Repeat Stepper -Main System NSR Main Body & Control Rack 1 OK -Main System Cymer Laser 1 OK -Main System Temperature Controller Rack 1 OK -Main System -Handler System Wafer Loader Type 3 1 OK -Factory Interface SMIF 2 OKOEMモデルの説明
The DUV Stepper is an all-in-one KrF system for high-volume production of advanced logic and memory ICs. It features a 0.60 NA sense for 0.25 micron resolution and can process over 85 200mm wafers per hour. The exposure area is 22mm x 22mm.ドキュメント
ドキュメントなし
カテゴリ
Steppers & Scanners
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
103910
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
NIKON
NSR-2205EX14C
カテゴリ
Steppers & Scanners
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
103910
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
NIKON DUV STEPPER構成
-Software Version: MCSV E3.42, OCSV E3.42, -CIM: SECS -Process: Lithography Exposure Step and Repeat Stepper -Main System NSR Main Body & Control Rack 1 OK -Main System Cymer Laser 1 OK -Main System Temperature Controller Rack 1 OK -Main System -Handler System Wafer Loader Type 3 1 OK -Factory Interface SMIF 2 OKOEMモデルの説明
The DUV Stepper is an all-in-one KrF system for high-volume production of advanced logic and memory ICs. It features a 0.60 NA sense for 0.25 micron resolution and can process over 85 200mm wafers per hour. The exposure area is 22mm x 22mm.ドキュメント
ドキュメントなし