説明
i-Line Wide-Field Stepper構成
Tool is operating in clean room. Labelled as Collateral Asset. Pictures: Please see. Configurations will be provided. Additional performance data will be collected. Missing or damaged parts: Not reported.OEMモデルの説明
NSR-SF130, a scan-field i-line stepper with high throughput and extremely low cost of ownership. The system makes use of leading-edge lens technology to achieve the same wide exposure field (26×33 mm) as DUV scanners, making it ideal for mix and match applications. The NSR-SF130, Nikon’s fifth new semiconductor systems announced in 2003, achieves a resolution of 280 nm or better and boasts a throughput of 120 wafers/hour for 300 mm wafers. The system combines superior performance with the lowest cost of ownership to help reduce semiconductor manufacturing costs.ドキュメント
ドキュメントなし
NIKON
NSR-SF130
検証済み
カテゴリ
Steppers & Scanners
最終検証： 20日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
11980
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
NIKON
NSR-SF130
カテゴリ
Steppers & Scanners
最終検証： 20日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
11980
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
i-Line Wide-Field Stepper構成
Tool is operating in clean room. Labelled as Collateral Asset. Pictures: Please see. Configurations will be provided. Additional performance data will be collected. Missing or damaged parts: Not reported.OEMモデルの説明
NSR-SF130, a scan-field i-line stepper with high throughput and extremely low cost of ownership. The system makes use of leading-edge lens technology to achieve the same wide exposure field (26×33 mm) as DUV scanners, making it ideal for mix and match applications. The NSR-SF130, Nikon’s fifth new semiconductor systems announced in 2003, achieves a resolution of 280 nm or better and boasts a throughput of 120 wafers/hour for 300 mm wafers. The system combines superior performance with the lowest cost of ownership to help reduce semiconductor manufacturing costs.ドキュメント
ドキュメントなし