The EI-5 is a Batch or Loard Lock Type High Vacuum Evaporation System. It has a substrate size: φ2 to 6 inch Supports rectangular,Si, compounds, glass and ceramics substrates"

ULVAC

ei-5

EI-7K

EBX 8C

EBX-16C

EBX 1000C

EBX-10C

EBX 1000

EI-OPT

EX 550-C10

Batch Type System
Various evaporation sources can be loaded. (EB,
RH, EB + RH)

Substrate size: φ2 to 6 inch Supports rectangular,
Si, compounds, glass and ceramics substrates

EI-7L

EBX 2000C

Loaded number / Revolution dome: 44 pc…Φ4 in / 20 pc…Φ6 in
SS distance: 900mm
Substrate holder: Revolution, Planetary or Satellite can be selected
Incident angle (Lift-off): 3.3°…Φ 4 in 4.9°…Φ 6 in

ei-7

Mini-Lab

EX 550

EX-400-C08

EX-550-D10-B

Batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate.

EI-5K

EX-550-T10

EBB-16C

YH 500AS

EBX 10D

CV-200

EX 650

EBS 10A

EBV-6DA

Batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate.

Supports various evaporation sources (i.e. EB, RH, EB + RH etc.).
Substrate holders complying with each process (i.e. lift-off, planetary, satellite etc.).
Supports various substrates; substrates size from φ2in to 6in, rectangular substrates, Si, compounds, glass and ceramics.
Display and operation on LCD touch panel.
Superior PC-operating system and functions (recipe function, data logging, maintenance assist function).

EI-5Z

EBX  6D

Satella is an advanced system designed for organic deposition processes, featuring a multiple independent chamber configuration that enables efficient full-color device production, a task challenging for its counterpart Solciet. It boasts a unique 7-sided transfer chamber and accommodates 2 to 4 organic deposition chambers, adjustable as required. Additionally, Satella is equipped with a high-precision mask alignment mechanism, specifically tailored for active-matrix full-color devices. It standardly supports substrates up to 200 mm in diameter, optimizing its usability in specialized manufacturing contexts.

SATELLA

EX 650-C16

batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate. 


Supports various evaporation sources (i.e. EB, RH, EB + RH etc.).
Substrate holders complying with each process (i.e. lift-off, planetary, satellite etc.).
Supports various substrates; substrates size from φ2in to 6in, rectangular substrates, Si, compounds, glass and ceramics.
Display and operation on LCD touch panel.
Superior PC-operating system and functions (recipe function, data logging, maintenance assist function).



EI-5T

MBE-BC2400

EBX 2000

EBH 6

EBV-6CH

EX-400

Batch type high vacuum evaporation equipment ei series is equipment that can form metal film or oxide film on the substrate. It can be controlled centrally through the operation panel to realize centralized automatic operation of vacuuming, film forming and other operations, which is suitable for research and development and small-scale production

EI-501z

ULVAC

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ei-5

EI-7K

EBX 8C

EBX-16C

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