説明
NanoSpec thin-film interferometer measurement instrument.構成
構成なしOEMモデルの説明
The NanoSpec 6100 is a tabletop film analysis system that provides fast and low-cost measurement capabilities for thin film metrology. It uses non-contact spectroscopic reflectometry to measure sites as small as 10µm in diameter on production wafers and can measure wafer substrates in the size range of 75 to 200mm and photomasks from 5 to 9 inches square. The system can measure film thickness in the range of 200Å - 20µm with the visible light source and 25Å - 20µm with an optional UV light source. The upper thickness range can be extended to 70µm with the thick film option. The system also has a motorized, precision x-y sample stage with a resolution of better than 1µm and a high-resolution color graphics display that provides contour and 3D film thickness mapping.ドキュメント
ドキュメントなし
ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 6100
検証済み
カテゴリ
Thin Film / Film Thickness
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
97672
ウェーハサイズ:
不明
ヴィンテージ:
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 6100
カテゴリ
Thin Film / Film Thickness
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
97672
ウェーハサイズ:
不明
ヴィンテージ:
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
NanoSpec thin-film interferometer measurement instrument.構成
構成なしOEMモデルの説明
The NanoSpec 6100 is a tabletop film analysis system that provides fast and low-cost measurement capabilities for thin film metrology. It uses non-contact spectroscopic reflectometry to measure sites as small as 10µm in diameter on production wafers and can measure wafer substrates in the size range of 75 to 200mm and photomasks from 5 to 9 inches square. The system can measure film thickness in the range of 200Å - 20µm with the visible light source and 25Å - 20µm with an optional UV light source. The upper thickness range can be extended to 70µm with the thick film option. The system also has a motorized, precision x-y sample stage with a resolution of better than 1µm and a high-resolution color graphics display that provides contour and 3D film thickness mapping.ドキュメント
ドキュメントなし