説明
OnTrak DSS-200 CMP Double Sided Brush Cleaner. Double sided wafer cleaner for post CMP cleaning. The DSS-200 scrubs, rinses and dries 4”, 6” or 8” (100, 150 or 200mm) wafers. System is currently configured for 6" by 6" squares. Parts needed to change sizes. Consists of system electronics, a send indexer, a brush cleaning station, spin station and robotic edge handling receive indexer. Wafers are DI sprayed while in sender, moved to brush stations where they are cleaned by top and bottom brushes with DI and/or cleaning chemistry. In spinning station they are DI rinsed and dried. CE marking.構成
OnTrak DSS-200 CMP Double Sided Brush Cleaner. Double sided wafer cleaner for post CMP cleaning. The DSS-200 scrubs, rinses and dries 4”, 6” or 8” (100, 150 or 200mm) wafers. System is currently configured for 6" by 6" squares. Parts needed to change sizes. Consists of system electronics, a send indexer, a brush cleaning station, spin station and robotic edge handling receive indexer. Wafers are DI sprayed while in sender, moved to brush stations where they are cleaned by top and bottom brushes with DI and/or cleaning chemistry. In spinning station they are DI rinsed and dried. CE marking.OEMモデルの説明
提供なしドキュメント
ドキュメントなし
LAM RESEARCH CORPORATION
ONTRAK DSS-200
検証済み
カテゴリ
Wafer Scrubber
最終検証： 23日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Deinstalled
製品ID：
100945
ウェーハサイズ：
4"/100mm, 6"/150mm, 8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
LAM RESEARCH CORPORATION
ONTRAK DSS-200
カテゴリ
Wafer Scrubber
最終検証： 23日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Deinstalled
製品ID：
100945
ウェーハサイズ：
4"/100mm, 6"/150mm, 8"/200mm
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
OnTrak DSS-200 CMP Double Sided Brush Cleaner. Double sided wafer cleaner for post CMP cleaning. The DSS-200 scrubs, rinses and dries 4”, 6” or 8” (100, 150 or 200mm) wafers. System is currently configured for 6" by 6" squares. Parts needed to change sizes. Consists of system electronics, a send indexer, a brush cleaning station, spin station and robotic edge handling receive indexer. Wafers are DI sprayed while in sender, moved to brush stations where they are cleaned by top and bottom brushes with DI and/or cleaning chemistry. In spinning station they are DI rinsed and dried. CE marking.構成
OnTrak DSS-200 CMP Double Sided Brush Cleaner. Double sided wafer cleaner for post CMP cleaning. The DSS-200 scrubs, rinses and dries 4”, 6” or 8” (100, 150 or 200mm) wafers. System is currently configured for 6" by 6" squares. Parts needed to change sizes. Consists of system electronics, a send indexer, a brush cleaning station, spin station and robotic edge handling receive indexer. Wafers are DI sprayed while in sender, moved to brush stations where they are cleaned by top and bottom brushes with DI and/or cleaning chemistry. In spinning station they are DI rinsed and dried. CE marking.OEMモデルの説明
提供なしドキュメント
ドキュメントなし