説明
Substrate Cleaning System構成
構成なしOEMモデルの説明
The highly efficient Model SCSe124 is the ideal solution for submicron cleaning of Photomasks, Wafers and Substrates. The very reliable and cost effective system utilizes proven assortment of cleaning technologies. The SCSe124 can be configured with several different cleaning options form High Pressure DI, Atomizing Mist Nozzle, Brushes, Megasonic Pies and Nozzles, and much more. The Rapid and Effective Drying technique combines Variable Spin Speeds optional Heated DI, Nitrogen Assist or Heat Lamp. The SCSe124 has a Microprocessor Controller allowing variable process parameters and retention of up to (10) ten process programs in memory.ドキュメント
ドキュメントなし
ULTRA-T EQUIPMENT / UTE
SCSe124
検証済み
カテゴリ
Wafer Scrubber
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
78197
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ULTRA-T EQUIPMENT / UTE
SCSe124
カテゴリ
Wafer Scrubber
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
78197
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Substrate Cleaning System構成
構成なしOEMモデルの説明
The highly efficient Model SCSe124 is the ideal solution for submicron cleaning of Photomasks, Wafers and Substrates. The very reliable and cost effective system utilizes proven assortment of cleaning technologies. The SCSe124 can be configured with several different cleaning options form High Pressure DI, Atomizing Mist Nozzle, Brushes, Megasonic Pies and Nozzles, and much more. The Rapid and Effective Drying technique combines Variable Spin Speeds optional Heated DI, Nitrogen Assist or Heat Lamp. The SCSe124 has a Microprocessor Controller allowing variable process parameters and retention of up to (10) ten process programs in memory.ドキュメント
ドキュメントなし