概要（Overview）

AWP wet benches are configurable for nearly all clean, etch, strip & solvent applications: - Available for both 200mm and 300mm wafer processing - Fully integrated superior Marangoni® drying technology as standard - High throughput due to dual dryer capability and advanced scheduler - Lowest COO based on extended bath life with concentration control and spiking - Field proven robust performance and reliability with more than 300 tools installed - Typical field data (US, Europe, Asia): 96% uptime - Reliable software with functional host interface for high flexibility