Screen Semiconductor offers a variety of products throughout the semiconductor manufacturing processes: Screen offer tools for the following processes: Wafer cleaning system, measurement system, coat/develop track, inspection system, annealing system, and advanced packaging lithography.

The AQUASPIN SU-3300 single wafer cleaning system delivers industry-leading productivity and high processing performance.

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SU-3300

200mm wafer size single wafer cleaning system.

SR-2000

CW-1500 wafer cleaning system for manufacturing green devices. Full-scale entry into environmental technology fields including LEDs and power devices.

CW-1500

Single-wafer cleaning system for 300mm wafers.
The AQUASPIN MP-3000 will be used for 0.13 μm and even precise cleaning processes,
supporting the finer design rules of advanced device technology.

MP-3000

WS 820

SB-3300 hybrid type wafer back-side cleaning system is developed with both chemical and brush cleaning functions.

SB-3300

Wafer size 150mm ~ 200mm
Inherits High-end Single Wafer Cleaning Technology to Deliver Outstanding Cost Performance. SU-2000 is a single-wafer cleaning system for ultra-thin substrate wafers. When the footprint of the SU-2000 (four-chamber specification) is compared with that of our existing two-chamber MP-2000, it is just 14 percent larger. This represents a major space saving and means the SU-2000 can be used to replace the MP-2000.

SU-2000

SR-8040-A

WS-820S

WS-8200

300mm wafer size single wafer cleaning tool.

SR-3000

F-Wet 300mm
Nano process capability for 45nm and lower
Provides throughput of up to 650 WPH
Short delivery time and fast setup
Highly stable and reliable
Flexible system configurations

FC-3100

300mm wafer size wafer single wafer cleaning tool.

SU-3000

The 'SU-3100' Single-wafer cleaning system.
Up to 8 built-in chambers and superior 300 wafer per hour productivity.

SU-3100

The FC-3000 is the leading-edge single bath wet station for the next-generation 300 mm wafer cleaning. It is a combination of the best cleaning technologies taken from the WS-620/820 multi-bath wet station series and the ultra-clean processing capability of the F-WET single bath wet station series. This powerful combination of technologies allows you to obtain optimal cleaning results with both concentrated and dilute chemistries in a smaller, fixed footprint design. The FC-3000 has built-in tools such as the schedule optimization function which allows you to easily monitor equipment productivity indices such as throughput rate and Cost-of-Ownership information such as chemical/DI water consumption, enabling low C.O.O. and stable processing.

FC-3000

The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.

AS-2000

The WS-820L Wet Station is a cassetteless wafer cleaning system for 8-inch wafers. It can be custom-configured to meet your precise needs simply by combining compactly designed interface, processing, drying and transfer modules. The WS-820L is further distinguished by its high-tolerance processing, stability, and ease of operation and maintenance. It sets new benchmarks for productivity and advances the overall rationalization of the wafer rinsing process.

WS-820L

The AQUASPIN SU-3200 single wafer cleaning system is able to spray chemical to achieve individual wafer cleaning.

SU-3200

FL-820L

High Throughput Batch Cleaning Systems Enable Flexible Line Configurations:
WS-820C is for 200 mm wafers with carrier transfer processing.

WS-820C

The FC-821L is a single-bath cleaning system that integrates our finest chemical circulation cleaning technologies, perfected in our renowned multi-bath Wet Stations. It is an unprecedentedly efficient system that incorporates a low-pressure dryer to prevent water mark generation during the drying processes. The FC-821L meets all the rigorous challenges of next-generation cleaning by realizing quarter-micron processing with accelerated throughput yet reduced chemical consumption. By decreasing cleaning units, as in the popular FS-820L, we can offer compact designs and radical space savings than previous multi-bath systems. Installing the FC-821L directly adjoining the next process equipment significantly slashes space demands in limited clean room environments. Moreover, the consequent minimized wafer transfer between processings greatly inhibits the generation of native oxides and other contamination.

FC-821L

FS-820L

Wafer size 50mm ~ 200mm
Half the Footprint, 1.5 Times the Productivity! Excellent Cost-Performance!
CW-2000 high-performance wet station with 50% smaller footprint and 150% higher productivity.

CW-2000

High Throughput Batch Cleaning Systems Enable Flexible Line Configurations:
The WS-620C for 150 mm wafers.

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