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The DV-28F is the first system in the Da Vinci Series, a revolutionary spin-processing platform for single-wafer cleaning. It is optimized for high-volume etch residue removal on 200mm wafers at the 90nm node and offers flexible chemistry application. The system delivers optimized process performance, high throughput, and reduced media consumption, resulting in low CoO.
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検査、保証、鑑定、ロジスティクス