メインコンテンツにスキップ
Moov logo

Moov Icon
TEL / TOKYO ELECTRON EXPEDIUS +
    説明
    説明なし
    構成
    Details attached.
    OEMモデルの説明
    The EXPEDIUS™ + is designed for 45nm and beyond technology node and has improved upon its predecessor in both performance and productivity. The configuration of the chemical treatment tanks, pure water rinse tanks, and dryer has been optimized to support FEOL clean, which requires particularly stringent process performance. Standard installation of the new SD2 dryer enables significant reduction of 45nm size or less micro-particles. The new SD2 which has been improved from TEL's original IPA dry module decreases the surface tension and prevents pattern destruction of vulnerable structures on the wafer. Furthermore the EXPEDIUS™ + provides high throughput and excellent productivity through a new wafer transportation system with smaller footprint. In addition, its unique batch-formation software option enhances process efficiency regardless of wafer quantity and processing position.
    ドキュメント

    TEL / TOKYO ELECTRON

    EXPEDIUS +

    verified-listing-icon

    検証済み

    カテゴリ

    Wet processing
    最終検証: 60日以上前
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    31305


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    2007

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    TEL / TOKYO ELECTRON EXPEDIUS +
    TEL / TOKYO ELECTRONEXPEDIUS +Wet processing
    ヴィンテージ: 2007状態: 中古
    最終確認23日前

    TEL / TOKYO ELECTRON

    EXPEDIUS +

    verified-listing-icon

    検証済み

    カテゴリ

    Wet processing
    最終検証: 60日以上前
    listing-photo-74663f4277d94cf28064a94e20cb793f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2109/74663f4277d94cf28064a94e20cb793f/1bdb3d4039d34d66a4d0909eeb9a1d46_d7bfeae340454a5b9d2c455dc0f7fd661105c_mw.jpeg
    listing-photo-74663f4277d94cf28064a94e20cb793f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2109/74663f4277d94cf28064a94e20cb793f/8493547a21564f1ca84758856fd929cd_3203f38c4e85417d900641925828030e1105c_mw.jpeg
    listing-photo-74663f4277d94cf28064a94e20cb793f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2109/74663f4277d94cf28064a94e20cb793f/df6d79f81d844edabeb7ea3891c7163e_e853833789794e71a4af9a32c55a259a1105c_mw.jpeg
    listing-photo-74663f4277d94cf28064a94e20cb793f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2109/74663f4277d94cf28064a94e20cb793f/2eb8c13b6d634115a6b90f5dee8ec9b1_6f9e5ab1cbb54bf0839d9089ad5eb97a1201a_mw.jpeg
    listing-photo-74663f4277d94cf28064a94e20cb793f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2109/74663f4277d94cf28064a94e20cb793f/bab7b664d31243f99a8b590939dac641_321b890b98cc47a6b0a4a010ae066ece1201a_mw.jpeg
    listing-photo-74663f4277d94cf28064a94e20cb793f-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2109/74663f4277d94cf28064a94e20cb793f/eaf2bdaab7584e6ba3e947867f4ddeac_afe56c31adb247c7ad214eec2c30bf691201a_mw.jpeg
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    31305


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    2007


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    Details attached.
    OEMモデルの説明
    The EXPEDIUS™ + is designed for 45nm and beyond technology node and has improved upon its predecessor in both performance and productivity. The configuration of the chemical treatment tanks, pure water rinse tanks, and dryer has been optimized to support FEOL clean, which requires particularly stringent process performance. Standard installation of the new SD2 dryer enables significant reduction of 45nm size or less micro-particles. The new SD2 which has been improved from TEL's original IPA dry module decreases the surface tension and prevents pattern destruction of vulnerable structures on the wafer. Furthermore the EXPEDIUS™ + provides high throughput and excellent productivity through a new wafer transportation system with smaller footprint. In addition, its unique batch-formation software option enhances process efficiency regardless of wafer quantity and processing position.
    ドキュメント
    同様のリスト
    すべて表示
    TEL / TOKYO ELECTRON EXPEDIUS +
    TEL / TOKYO ELECTRON
    EXPEDIUS +
    Wet processingヴィンテージ: 2007状態: 中古最終検証: 23日前
    TEL / TOKYO ELECTRON EXPEDIUS +
    TEL / TOKYO ELECTRON
    EXPEDIUS +
    Wet processingヴィンテージ: 2007状態: 中古最終検証: 23日前
    TEL / TOKYO ELECTRON EXPEDIUS +
    TEL / TOKYO ELECTRON
    EXPEDIUS +
    Wet processingヴィンテージ: 0状態: 中古最終検証: 30日前