ASML TWINSCAN XT:1250 – a very high resolution (0.85 numerical aperture) volume production system that extends imaging to the 65-nanometer line width on both 200- and 300-millimeter wafers using 193-nanometer wavelength, while highly friendly for customer facilities: footprint reduced by 25 percent and facility requirements reduced by 50 percent

ASML provides chipmakers with everything they need – hardware, software and services – to mass produce patterns on silicon through lithography.

TWINSCAN XT:1250B

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