The TWINSCAN XT:1460K is a high-productivity dry ArF lithography tool with excellent overlay and imaging performance for volume production at 65 nm resolution. The TWINSCAN XT:1460K 193 nm step-and-scan system is a high-productivity, dual-stage ArF lithography tool designed for volume 300 mm wafer production at 65 nm resolution. The TWINSCAN XT:1460K contains a variable 0.93 NA 193 nm projection lens with advanced lens manipulators.

ASML provides chipmakers with everything they need – hardware, software and services – to mass produce patterns on silicon through lithography.

TWINSCAN XT:1460K

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