AVIZA

CELSIOR

Celsior fxP

Verano-5000 is a batch Atomic Layer Deposition (ALD) system developed by Aviza. It is designed to process 300mm wafers and meet the requirements of nano-scale processing and high productivity beyond the 90-nanometer node. The system can process 50 wafers at a time, achieving a relatively low cost of ownership without compromising on uniformity and step coverage.

VERANO-5000

Pantheon is a system developed by Aviza that is designed to meet the process and productivity requirements of today and beyond the 90-nanometer node. It is a multi-chamber single wafer cluster tool that can be configured for both 200mm and 300mm wafer sizes. The system offers precise atomic-level thickness control, low process temperature, and highly conformal coatings with excellent film quality for a wide range of films, including Al2O3, HfO2, TiO2, HfSiOx, and TiN.

AVIZA

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トップAVIZA ALD

CELSIOR

Celsior fxP

VERANO-5000

PANTHEON

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すべてのAVIZA ALD