The mask aligner UV-KUB 3 is the first mask alignment system equipped with a UV-LED light source, that provide an unrivalled collimation and homogeneous exposure, on the international market. Compact, easy to use and efficient, the mask alignment system UV-KUB 3 allows alignment up to 7" photolithography mask with substrates up to 6" in a cube volume of 48cm size.

KLOE

UV-KUB 3

The maskless equipment Dilase 250, a versatile and compact equipment, gives access to laser lithography for a wide range of new applications such as microfluidics, micromechanics or photonics. Dilase 250 is especially well suited for fast prototyping, photolithography mask fabrication and microfabrication directly on thin or thick film substrates of several tens or hundreds of microns.

Dilase 250

The high resolution direct laser lithography system Dilase 650 offers you the possibility to work with one or two writing lasers, to be focused into one or two beam sizes ranging from 1µm to 50µm automatically switchables. It allows the writing on any type of substrate (photolithography masks, semiconductors, glass, polymers, crystals, flexible films...) over a surface area as large as 6 inches.



KLOE

概要（Overview）

現在の掲載品

全ての製品

サービス

トップ製品

UV-KUB 3

Dilase 250

DILASE 650

Moovに掲載品して、すぐに申し分ない購入者を見つけましょう。

全ての製品

全ての掲載品を見る