The Matrix System One Model 105 Asher is a single chamber, automatic microprocessor-controlled photoresist stripper that is set up for 4″ – 6″ wafers. It is configured for up to 6″ wafers and has independent control of pressure, RF power, temperature, gas flow, & substrate position. The Matrix 105 Asher has a 600W RF water-cooled generator and a multi-step program (three steps + over etch) process program. It also has a “Butterfly” Valve for more precise pressure control and a phase magnitude detector to provide real-time RF impedance matching control. The Matrix 105 Asher has two Mass Flow Controllers and a Vacuum Hose Assembly. The range for Strip is 150C to 250C +/-5C and the range for Descum is 70C to 150C +/-5C. It also has a Wafer Lift Pin Assembly (up and down).

MATRIX

The System 1 family of ashers and etchers remains a reliable and cost-effective solution for semiconductor IC fabs, optoelectronics, Thin Film Head/Data Storage, and MicroElectro-Mechanical Systems (MEMS) in Silicon, Gallium Arsenide, and Indium Phosphide processing. Handle wafer sizes ranging from 50mm to 150mm round and 4.5" square with ease.

SYSTEM ONE

CL-508

Low temperature, controlled resist/polyimide strip, descum/clean, surface prep, metal de-oxidation, TFH clean.

MATRIX

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CL-508

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