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AXCELIS / FUSION FUSION ES3
  • AXCELIS / FUSION FUSION ES3
  • AXCELIS / FUSION FUSION ES3
  • AXCELIS / FUSION FUSION ES3
説明
ETCH
構成
構成なし
OEMモデルの説明
The FusionES3 is a 300mm plasma asher with dry strip capabilities, designed for post-implant and post-etch process steps. It has a flexible process architecture, making it suitable for conventional and dual damascene process flows. It provides dry resist and residue removal, and its elevated ash rate delivers high throughput and productivity. The tool is designed to run oxidizing, fluorinated, and reducing chemistries. Its unique dual-chamber platform enables dry strip and residue removal to be performed within a single chamber, increasing productivity and reducing the system footprint.
ドキュメント

ドキュメントなし

カテゴリ
Ashers / Plasma Cleaner

最終検証: 60日以上前

主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

47118


ウェーハサイズ:

12"/300mm


ヴィンテージ:

不明


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

AXCELIS / FUSION

FUSION ES3

verified-listing-icon
検証済み
カテゴリ
Ashers / Plasma Cleaner
最終検証: 60日以上前
listing-photo-92f236c5e84a4e2e914fe18c8b6c73f8-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

47118


ウェーハサイズ:

12"/300mm


ヴィンテージ:

不明


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
ETCH
構成
構成なし
OEMモデルの説明
The FusionES3 is a 300mm plasma asher with dry strip capabilities, designed for post-implant and post-etch process steps. It has a flexible process architecture, making it suitable for conventional and dual damascene process flows. It provides dry resist and residue removal, and its elevated ash rate delivers high throughput and productivity. The tool is designed to run oxidizing, fluorinated, and reducing chemistries. Its unique dual-chamber platform enables dry strip and residue removal to be performed within a single chamber, increasing productivity and reducing the system footprint.
ドキュメント

ドキュメントなし