説明
System controller (CPU board, AI/O board, DI/O board) RF generator rack (RF bias generator, RF source generator) Process chamber (RF bias matcher)構成
IRIDIAOEMモデルの説明
The PEP IRIDIA is an advanced cleaning system designed for sub-0.18-micron 200mm wafer applications. The IRIDIA’s modular architecture allows manufacturers to configure the system for both front and back-end-of-line cleaning applications down to 90 nanometer device geometries. Targeted at critical steps in copper and low-k manufacturing processes, the IRIDIA offers the highest productivity of any 200mm dry-clean system currently on the market.ドキュメント
ドキュメントなし
LAM RESEARCH / NOVELLUS / GASONICS
PEP IRIDIA
検証済み
カテゴリ
Ashers / Plasma Cleaner
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
92134
ウェーハサイズ:
不明
ヴィンテージ:
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH / NOVELLUS / GASONICS
PEP IRIDIA
カテゴリ
Ashers / Plasma Cleaner
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
92134
ウェーハサイズ:
不明
ヴィンテージ:
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
System controller (CPU board, AI/O board, DI/O board) RF generator rack (RF bias generator, RF source generator) Process chamber (RF bias matcher)構成
IRIDIAOEMモデルの説明
The PEP IRIDIA is an advanced cleaning system designed for sub-0.18-micron 200mm wafer applications. The IRIDIA’s modular architecture allows manufacturers to configure the system for both front and back-end-of-line cleaning applications down to 90 nanometer device geometries. Targeted at critical steps in copper and low-k manufacturing processes, the IRIDIA offers the highest productivity of any 200mm dry-clean system currently on the market.ドキュメント
ドキュメントなし