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LAM RESEARCH / NOVELLUS / GASONICS L3510
    説明
    説明なし
    構成
    SW Ver: 7.5 gem mw power 1.25kw Model: C12935 Gas 2 Gas O2. & N2 Robot: Brooks Zbot
    OEMモデルの説明
    PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.
    ドキュメント

    ドキュメントなし

    LAM RESEARCH / NOVELLUS / GASONICS

    L3510

    verified-listing-icon

    検証済み

    カテゴリ
    Ashers / Plasma Cleaner

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    98801


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    LAM RESEARCH / NOVELLUS / GASONICS L3510

    LAM RESEARCH / NOVELLUS / GASONICS

    L3510

    Ashers / Plasma Cleaner
    ヴィンテージ: 0状態: 中古
    最終確認60日以上前

    LAM RESEARCH / NOVELLUS / GASONICS

    L3510

    verified-listing-icon
    検証済み
    カテゴリ
    Ashers / Plasma Cleaner
    最終検証: 60日以上前
    listing-photo-bf62104737fc4bad97d985597a7e1dd4-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    98801


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    SW Ver: 7.5 gem mw power 1.25kw Model: C12935 Gas 2 Gas O2. & N2 Robot: Brooks Zbot
    OEMモデルの説明
    PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    LAM RESEARCH / NOVELLUS / GASONICS L3510

    LAM RESEARCH / NOVELLUS / GASONICS

    L3510

    Ashers / Plasma Cleanerヴィンテージ: 0状態: 中古最終検証:60日以上前
    LAM RESEARCH / NOVELLUS / GASONICS L3510

    LAM RESEARCH / NOVELLUS / GASONICS

    L3510

    Ashers / Plasma Cleanerヴィンテージ: 1996状態: 中古最終検証:60日以上前
    LAM RESEARCH / NOVELLUS / GASONICS L3510

    LAM RESEARCH / NOVELLUS / GASONICS

    L3510

    Ashers / Plasma Cleanerヴィンテージ: 0状態: 中古最終検証:60日以上前