説明

The Glen R3A Plasma Cleaning System is PLC controlled and offers real-time plain English readout of system operating parameters together with remedial action in the event of an abort. This 500 watt plasma cleaner has two 14 x 14-inch electrode sets (capable of up to 8 sample trays) which can be quickly configured to provide any of these three plasma modes: Active Plasma for routine cleaning of sample surfaces; RIE Plasma for aggressive cleaning of non ESD sensitive samples; and Downstream, Electron-Free Plasma for cleaning sensitive electronic components normally associated with the semiconductor industry. The Glen R3A Plasma Cleaner can be operated in a single or dual plasma sequence with two computer selected plasma gas inputs and a connection for a backfill gas (typically nitrogen). The Glen R3A has RS 232 interface as standard. - System Power Source: Advanced Energy PE-1000 AC Plasma Power Source; 1KW @ 40kHz - Electrodes: Qty-2 14 x 14-inch electrode sets; capable of up to 8 sample trays - 3 Plasma Modes: ACTIVE PLASMA for routine cleaning of sample surfaces; RIE PLASMA for aggressive cleaning of non-ESD sensitive samples; and DOWNSTREAM ELECTRON-FREE PLASMA for cleaning sensitive electronic components - Gas Inputs: Computer-controlled; 2 process gases, 1 purge gas - Computer Interface: RS 232 interface - Power Requirements: 110Volt / 60Hz / 1Phase - Full Load Current Rating: 13 Amp