説明
説明なし構成
300mm optional 200mm Incl chiller, pumps, gasboxes decomissioned in working conditioning, in production till April 2022 System comes incl following spare parts. Spare chamber module, All quarts parts used for 1 chamber Main Computer Microwave 3 pieces Lampcontrollers etc. Lamps approx. 75 pieces Touchscreen SMC foreline valve Throttle valve Edwards IH1800NRV pumps only 12.000 /10.000 Hrs running timeOEMモデルの説明
The FusionES3 is a 300mm plasma asher with dry strip capabilities, designed for post-implant and post-etch process steps. It has a flexible process architecture, making it suitable for conventional and dual damascene process flows. It provides dry resist and residue removal, and its elevated ash rate delivers high throughput and productivity. The tool is designed to run oxidizing, fluorinated, and reducing chemistries. Its unique dual-chamber platform enables dry strip and residue removal to be performed within a single chamber, increasing productivity and reducing the system footprint.ドキュメント
ドキュメントなし
AXCELIS / FUSION
FUSION ES3
検証済み
カテゴリ
Ashers
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
65306
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
AXCELIS / FUSION
FUSION ES3
カテゴリ
Ashers
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
65306
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2001
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
300mm optional 200mm Incl chiller, pumps, gasboxes decomissioned in working conditioning, in production till April 2022 System comes incl following spare parts. Spare chamber module, All quarts parts used for 1 chamber Main Computer Microwave 3 pieces Lampcontrollers etc. Lamps approx. 75 pieces Touchscreen SMC foreline valve Throttle valve Edwards IH1800NRV pumps only 12.000 /10.000 Hrs running timeOEMモデルの説明
The FusionES3 is a 300mm plasma asher with dry strip capabilities, designed for post-implant and post-etch process steps. It has a flexible process architecture, making it suitable for conventional and dual damascene process flows. It provides dry resist and residue removal, and its elevated ash rate delivers high throughput and productivity. The tool is designed to run oxidizing, fluorinated, and reducing chemistries. Its unique dual-chamber platform enables dry strip and residue removal to be performed within a single chamber, increasing productivity and reducing the system footprint.ドキュメント
ドキュメントなし