説明
説明なし構成
Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:60 AMPS60 AMPS Recommended Packaging Form:CUSTOM PALLETCUSTOM PALLET Dimensions: StandardMetric Overall:51 x 81 x 80 IN - 3000 LBS1295.40 x 2057.40 x 2032.00 mm - 1360.80 kgOEMモデルの説明
The Spray Acid Tool (SAT) is a versatile tool that offers a range of cleaning, etching, and stripping capabilities. It features a multichamber design that allows for safe and economical operation in a completely closed environment. The SAT is 300mm ready, meaning it can handle wafers of that size. Some of the specific applications of the SAT include post-CMP clean, photo-resist strip, polymer removal, pre-diffusion clean, monitor wafer clean, and metal etch. These processes are essential for the preparation and maintenance of semiconductor wafers during the manufacturing process.ドキュメント
ドキュメントなし
SEMITOOL
SAT
検証済み
カテゴリ
Wet processing
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
39654
ウェーハサイズ：
不明
ヴィンテージ：
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
SEMITOOL
SAT
検証済み
カテゴリ
Wet processing
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
39654
ウェーハサイズ：
不明
ヴィンテージ：
2004
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:60 AMPS60 AMPS Recommended Packaging Form:CUSTOM PALLETCUSTOM PALLET Dimensions: StandardMetric Overall:51 x 81 x 80 IN - 3000 LBS1295.40 x 2057.40 x 2032.00 mm - 1360.80 kgOEMモデルの説明
The Spray Acid Tool (SAT) is a versatile tool that offers a range of cleaning, etching, and stripping capabilities. It features a multichamber design that allows for safe and economical operation in a completely closed environment. The SAT is 300mm ready, meaning it can handle wafers of that size. Some of the specific applications of the SAT include post-CMP clean, photo-resist strip, polymer removal, pre-diffusion clean, monitor wafer clean, and metal etch. These processes are essential for the preparation and maintenance of semiconductor wafers during the manufacturing process.ドキュメント
ドキュメントなし