説明
300mm depending on model Resolution: 1.8nm R&D to mass production High throughput (Faster: 36~50 wafers/h) Refurbished equipment Overhaul customer's inventory On site trouble shooting Periodic maintenance, tip replacement Fab to fab or inside fab relocations Wafer modification構成
構成なしOEMモデルの説明
The CG4100 is a high-throughput instrument for 32-nm process production and 22-nm process development which was designed to meet the measurement needs of the latest generation of double patterning techniques.ドキュメント
ドキュメントなし
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HITACHI
CG4100
カテゴリ
CD-SEM
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
131697
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
300mm depending on model Resolution: 1.8nm R&D to mass production High throughput (Faster: 36~50 wafers/h) Refurbished equipment Overhaul customer's inventory On site trouble shooting Periodic maintenance, tip replacement Fab to fab or inside fab relocations Wafer modification構成
構成なしOEMモデルの説明
The CG4100 is a high-throughput instrument for 32-nm process production and 22-nm process development which was designed to meet the measurement needs of the latest generation of double patterning techniques.ドキュメント
ドキュメントなし