説明
EVAPORATION構成
構成なしOEMモデルの説明
Hitachi High-Technologies Corporation has launched DESIGNGAUGE, a mask design data measuring system aimed at improving efficiency and production yield in semiconductor device design and development. DESIGNGAUGE accurately collates and compares mask pattern design data with circuit pattern image data on the wafer, obtained through a critical dimension scanning electron microscope (CD-SEM). It enables the creation of measurement recipes offline that were previously only possible with a CD-SEM, allowing remote control of the CD-SEM to automatically align mask pattern design data with the wafer's test pattern. This significantly streamlines the data acquisition process for creating an optical proximity correction (OPC) model, reducing the time required compared to conventional techniques. Hitachi High-Tech is committed to further enhancing the accuracy and capabilities of DESIGNGAUGE and developing DFM-based measuring technologies to meet evolving metrology needs.ドキュメント
ドキュメントなし
HITACHI
S-9380 II
検証済み
カテゴリ
CD-SEM
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
38558
ウェーハサイズ：
6"/150mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
HITACHI
S-9380 II
カテゴリ
CD-SEM
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
38558
ウェーハサイズ：
6"/150mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
EVAPORATION構成
構成なしOEMモデルの説明
Hitachi High-Technologies Corporation has launched DESIGNGAUGE, a mask design data measuring system aimed at improving efficiency and production yield in semiconductor device design and development. DESIGNGAUGE accurately collates and compares mask pattern design data with circuit pattern image data on the wafer, obtained through a critical dimension scanning electron microscope (CD-SEM). It enables the creation of measurement recipes offline that were previously only possible with a CD-SEM, allowing remote control of the CD-SEM to automatically align mask pattern design data with the wafer's test pattern. This significantly streamlines the data acquisition process for creating an optical proximity correction (OPC) model, reducing the time required compared to conventional techniques. Hitachi High-Tech is committed to further enhancing the accuracy and capabilities of DESIGNGAUGE and developing DFM-based measuring technologies to meet evolving metrology needs.ドキュメント
ドキュメントなし