KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

8250XR

The eCD 1— unveiled in February 2003—features the precision and resolution to meet the CD metrology performance requirements for the 90-nm technology node
and beyond. The eCD 1 is based on a new platform, and all its design aspects have been precision suited for 90-nm node metrology requirements, and extendible to the
65-nm node. eCD 1 is well suited for applications involving 193-nm lithography and very-high-aspect-ratio structures.

eCD-1 

The 8250-R reticle CD control system, which is based on the 8200/8400 CD SEM platform. The 8250-R provides extremely precise and high-throughput measurements on        advanced reticles used in the production of sub-0.13-micron devices.

8250-R

CD SEM for 300mm combine high throughput, advanced imaging, superior measurement precision and enhanced productivity capabilities in a new Windows NT-based platform.

 8300

8100-R

The 8250 CD SEM Metrology system is a comprehensive solution for controlling critical dimensions in semiconductor device manufacturing. It offers real-time quality control during the etching process and correlation between the reticle and wafer dimensions. With direct device measurements, it allows for in-device CD control. The system improves edge capture for contacts and trenches, particularly at the bottom. The 8250 series is part of the 8200 CD SEM systems, which are used for lithography, etching, data storage, and reticle measurement applications. These systems provide superior image quality on reticles and charge-sensitive wafer layers, enabling automated metrology on poly layers, low-k dielectrics, and challenging substrates. When combined with SpectraCD, lithography data analysis, and advanced process control, the 8250 series forms a complete CD solution that enhances pattern transfer quality, bin yield, and device performance.

8250

eCD-2XP

8100XPR

eCD-2

CD-SEM for 200 mm wafers combine high throughput, advanced imaging, superior measurement precision and enhanced productivity capabilities in a new Windows NT-based platform.

8200

8100XPT

KLA, a leading company in the field of metrology, has invested heavily in engineering and manufacturing to develop its next-generation tool, the KLA 8100. This advanced E-Beam metrology system builds on the success of KLA’s first-generation tool, which boasted high throughput and an automated setup process. The KLA 8100 promises to be even more advanced, making it an attractive option for manufacturers.

8100

The KLA-Tencor 8100XP CD SEM is a state-of-the-art scanning electron microscope used in semiconductor manufacturing. It enables precise and fast measurements of critical dimensions (CD) in small device geometries. The CD SEM has advanced capabilities for imaging and measuring high aspect ratio features, ensuring optimum device performance. It offers productivity-enhancing features such as high throughput, networking, offline recipe setup, and full system automation.

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

KLA

概要（Overview）

現在の掲載品

全ての製品

サービス

トップKLA CD-SEM

eCD-2XP

8250

8100-R

8100XPR

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すべてのKLA CD-SEM